Anisotropic etching is preferred for creating high-aspect-ratio nanostructures with vertical sidewalls, such as nanowires, nanopillars, or deep trenches. Anisotropic wet etching is a common method for ...

To obtain anisotropic profiles, the DSiE technique or the Deep Reactive Ion Etching (DRIE) repeatedly integrates isotropic silicon etching ... Image Credit: Oxford Instruments Plasma Technology 25 nm ...